HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition
| Autor: | Yin, Chaoyi, Zhu, Meiping, Zeng, Tingting, Song, Chen, Chai, Yingjie, Shao, Yuchuan, Zhang, Rongjun, Zhao, Jiaoling, Li, Dawei, Shao, Jianda |
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| Zdroj: | In Journal of Alloys and Compounds 5 April 2021 859 |
| Databáze: | ScienceDirect |
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