A novel focused-ion-beam lithography process for sub-100 nanometer technology nodes
| Autor: | Arshak, Khalil, Mihov, Miroslav, Nakahara, Shohei, Arshak, Arous, McDonagh, Declan |
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| Zdroj: | In Superlattices and Microstructures 2004 36(1):335-343 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect