Evolution of microstructural and electrical properties of sputtered HfO2 ceramic thin films with RF power and substrate temperature
| Autor: | Das, K.C., Ghosh, S.P., Tripathy, N., Kim, D.H., Lee, T.I., Myoung, J.M., Kar, J.P. |
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| Zdroj: | In Ceramics International January 2016 42(1) Part A:138-145 |
| Databáze: | ScienceDirect |
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