Novel degradation model of MOSFET thin gate oxide induced by VUV photons during high density plasma oxide deposition
| Autor: | Kim, Moojin, Lee, Jeongyun, Kim, Dongkwon, Min, Gyungjin |
|---|---|
| Zdroj: | In Surface & Coatings Technology 15 August 2013 228 Supplement 1:S511-S515 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect