Growth of AlN films on Si (100) and Si (111) substrates by reactive magnetron sputtering

Autor: Zhang, J.X. *, Cheng, H., Chen, Y.Z., Uddin, A., Yuan, Shu, Geng, S.J., Zhang, S.
Zdroj: In Surface & Coatings Technology 2005 198(1):68-73
Databáze: ScienceDirect