Epitaxial cobalt silicide formation using a Co/TiSix bilayer on Si (1 0 0) by sputtering
Autor: | Jeong, Jin Jung, Lim, Jongmin, Lee, Chongmu * |
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Zdroj: | In Surface & Coatings Technology 1 July 2003 171(1-3):6-10 |
Databáze: | ScienceDirect |
Externí odkaz: |