Epitaxial cobalt silicide formation using a Co/TiSix bilayer on Si (1 0 0) by sputtering

Autor: Jeong, Jin Jung, Lim, Jongmin, Lee, Chongmu *
Zdroj: In Surface & Coatings Technology 1 July 2003 171(1-3):6-10
Databáze: ScienceDirect