Kinetics of epitaxial growth of Si and SiGe films on (1 1 0) Si substrates
| Autor: | Sugiyama, N., Moriyama, Y., Nakaharai, S., Tezuka, T., Mizuno, T., Takagi, S. |
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| Zdroj: | In Applied Surface Science 2004 224(1):188-192 |
| Databáze: | ScienceDirect |
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