Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition
| Autor: | Sassi, Z, Chafik, K, Bureau, J.C, Glachant, A, Balland, B |
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| Zdroj: | In Applied Surface Science 2002 193(1):26-35 |
| Databáze: | ScienceDirect |
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