Maskless nano-implant of 20 keV Ga+ in bulk Si(1 0 0) substrates

Autor: Milazzo, R.G., D’Arrigo, G., Mio, A.M., Rimini, E., Spinella, C., Peto, L., Nadzeyka, A., Bauerdick, S.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B 15 December 2014 341:7-12
Databáze: ScienceDirect