The influence of the ion implantation temperature and the dose rate on smart-cut© in GaAs
| Autor: | Webb, M., Jeynes, C., Gwilliam, R., Too, P., Kozanecki, A., Domagala, J., Royle, A., Sealy, B. |
|---|---|
| Zdroj: | In Nuclear Inst. and Methods in Physics Research, B October 2005 240(1-2):142-145 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect