Measurement of minute local strain in semiconductor materials and electronic devices by using a highly parallel X-ray microbeam

Autor: Matsui, J., Tsusaka, Y., Yokoyama, K., Takeda, S., Katou, M., Kurihara, H., Watanabe, K., Kagoshima, Y., Kimura, S.
Zdroj: In Nuclear Inst. and Methods in Physics Research, B 2003 199:15-18
Databáze: ScienceDirect