Measurement of minute local strain in semiconductor materials and electronic devices by using a highly parallel X-ray microbeam
Autor: | Matsui, J., Tsusaka, Y., Yokoyama, K., Takeda, S., Katou, M., Kurihara, H., Watanabe, K., Kagoshima, Y., Kimura, S. |
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Zdroj: | In Nuclear Inst. and Methods in Physics Research, B 2003 199:15-18 |
Databáze: | ScienceDirect |
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