Structural properties of thin films of high dielectric constant materials on silicon

Autor: Lu, H.C., Yasuda, N., Garfunkel, E., Gustafsson, T., Chang, J.P., Opila, R.L., Alers, G.
Zdroj: In Microelectronic Engineering 1999 48(1):287-290
Databáze: ScienceDirect