Quantification of shear induced agglomeration in chemical mechanical polishing slurries under different chemical environments
| Autor: | Khanna, Aniruddh J., Gupta, Sushant, Kumar, Purushottam, Chang, Feng-Chi, Singh, Rajiv K. |
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| Zdroj: | In Microelectronic Engineering 1 April 2019 210:1-7 |
| Databáze: | ScienceDirect |
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