Supercritical fluid chemical deposition of Cu in Ru and TiN-lined deep nanotrenches using a new Cu(I) amidinate precursor
| Autor: | Rasadujjaman, Md, Watanabe, Mitsuhiro, Sudoh, Hiroshi, Machida, Hideaki, Kondoh, Eiichi |
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| Zdroj: | In Microelectronic Engineering 2 April 2015 137:32-36 |
| Databáze: | ScienceDirect |
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