Al 2O 3 stacks on In 0.53Ga 0.47As substrates: In situ investigation of the interface

Autor: Fusi, M., Lamagna, L., Spiga, S., Fanciulli, M., Brammertz, G., Merckling, C., Meuris, M., Molle, A.
Zdroj: In Microelectronic Engineering 2011 88(4):435-439
Databáze: ScienceDirect