The evolution of optical and electrical properties of low- k dielectrics under bias stress

Autor: Atkin, J.M., Cartier, E., Shaw, T.M., Lloyd, J.R., Laibowitz, R.B., Heinz, T.F.
Zdroj: In Microelectronic Engineering 2009 86(7):1891-1893
Databáze: ScienceDirect