High quality strained Si/SiGe substrates for CMOS and optical devices
| Autor: | Weber, J., Nebrich, L., Bensch, F., Neumeier, K., Vogg, G., Wieland, R., Bonfert, D., Ramm, P. |
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| Zdroj: | In Microelectronic Engineering 2005 82(3):215-220 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect