Impact of line edge roughness on the resistivity of nanometer-scale interconnects
| Autor: | Steinhögl, W., Schindler, G., Steinlesberger, G., Traving, M., Engelhardt, M. |
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| Zdroj: | In Microelectronic Engineering October 2004 76(1-4):126-130 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect