Fullerite C 60 as electron-beam resist for ‘dry’ nanolithography
| Autor: | Shnitov, V.V ∗, Mikoushkin, V.M, Gordeev, Yu.S |
|---|---|
| Zdroj: | In Microelectronic Engineering 2003 69(2):429-434 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Shnitov, V.V ∗, Mikoushkin, V.M, Gordeev, Yu.S |
|---|---|
| Zdroj: | In Microelectronic Engineering 2003 69(2):429-434 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect