Environment-proof writing chamber for next generation electron beam mask writing system
| Autor: | Ogasawara, M. ∗, Akeno, K., Hayashi, R., Yanaga, S., Kobayashi, N., Nishimura, S., Mitsui, S., Shimizu, M., Kusakabe, H., Tojo, T., Yasuda, S. |
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| Zdroj: | In Microelectronic Engineering 2002 61:337-342 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect