Room-temperature and low-pressure nanoimprint lithography
| Autor: | Lebib, A., Chen, Y. ∗, Cambril, E., Youinou, P., Studer, V., Natali, M., Pépin, A., Janssen, H.M., Sijbesma, R.P. |
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| Zdroj: | In Microelectronic Engineering 2002 61:371-377 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect