Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process

Autor: Kim, Hojoong, Hong, Seokjun, Shin, Cheolmin, Jin, Yinhua, Lim, Dong Hyun, Kim, Jun-yong, Hwang, Hasub, Kim, Taesung
Zdroj: In Wear 15 December 2017 392-393:93-98
Databáze: ScienceDirect