On temperature and flux dependence of isotropic silicon etching in inductively coupled SF[formula omitted] plasma
| Autor: | Rudenko, Mikhail, Kuzmenko, Vitaly, Miakonkikh, Andrey, Lukichev, Vladimir |
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| Zdroj: | In Vacuum October 2022 204 |
| Databáze: | ScienceDirect |
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