Microstructural, surface and interface properties of zirconium doped HfO2 thin films grown by RF co-sputtering technique
| Autor: | Das, K.C., Tripathy, N., Ghosh, S.P., Sharma, P., Singhal, R., Kar, J.P. |
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| Zdroj: | In Vacuum September 2017 143:288-293 |
| Databáze: | ScienceDirect |
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