SiGeSn growth studies using reduced pressure chemical vapor deposition towards optoelectronic applications
| Autor: | Wirths, S., Buca, D., Ikonic, Z., Harrison, P., Tiedemann, A.T., Holländer, B., Stoica, T., Mussler, G., Breuer, U., Hartmann, J.M., Grützmacher, D., Mantl, S. |
|---|---|
| Zdroj: | In Thin Solid Films 30 April 2014 557:183-187 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect