Low resistivity contacts to plasma etched Mg-doped GaN using very low power inductively coupled plasma etching
| Autor: | Baharin, A., Pinto, R.S., Mishra, U.K., Nener, B.D., Parish, G. |
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| Zdroj: | In Thin Solid Films 31 March 2011 519(11):3686-3689 |
| Databáze: | ScienceDirect |
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