Correlation between surface damage and micro-defects in Si covered with insulating layer by implantation of He and H ions

Autor: Liu, C.L., Li, M.K., Wang, Z., Gao, Y.J., Liao, J.Q., Zhang, D.C., Zhang, X.L., Shen, Y.Y.
Zdroj: In Thin Solid Films 2011 519(10):3162-3168
Databáze: ScienceDirect