Influences of deposition and crystallization kinetics on the properties of silicon films deposited by low-pressure chemical vapour deposition from silane and disilane
| Autor: | Temple-Boyer, Pierre, Rousset, B., Scheid, E. |
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| Zdroj: | In Thin Solid Films 2010 518(23):6897-6903 |
| Databáze: | ScienceDirect |
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