Effect of gas introduction position on substrate etching by means of Ar-dominated graphite-cathodic-arc plasma beam in μT-FAD
| Autor: | Tanoue, Hideto, Kamiya, Masao, Oke, Shinichiro, Suda, Yoshiyuki, Takikawa, Hirofumi, Hasegawa, Yushi, Taki, Makoto, Tsuji, Nobuhiro, Ishikawa, Takeshi, Yasui, Haruyuki, Temmei, Shuji, Takahashi, Hideo |
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| Zdroj: | In Thin Solid Films 2010 518(13):3546-3550 |
| Databáze: | ScienceDirect |
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