Tensile strain engineering of Si thin films using porous Si substrates
| Autor: | Boucherif, A., Blanchard, N.P., Regreny, P., Marty, O., Guillot, G., Grenet, G., Lysenko, V. |
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| Zdroj: | In Thin Solid Films 2010 518(9):2466-2469 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect