Formation of ‘environmentally friendly’ semiconductor (β-FeSi 2) thin films prepared by ion beam sputter deposition (IBSD) method
| Autor: | Sasase, M *, Nakanoya, T, Yamamoto, H, Hojou, K |
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| Zdroj: | In Thin Solid Films 2001 401(1):73-76 |
| Databáze: | ScienceDirect |
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