A SrRuO 3/IrO 2 top electrode FeRAM with Cu BEOL process for embedded memory of 130 nm generation and beyond
Autor: | Kumura, Y., Ozaki, T., Kanaya, H., Hidaka, O., Shimojo, Y., Shuto, S., Yamada, Y., Tomioka, K., Yamakawa, K., Yamazaki, S., Takashima, D., Miyakawa, T., Shiratake, S., Ohtsuki, S., Kunishima, I., Nitayama, A. |
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Zdroj: | In Solid State Electronics 2006 50(4):606-612 |
Databáze: | ScienceDirect |
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