Optimization of low temperature silicon nitride processes for improvement of device performance
| Autor: | Sleeckx, E., Schaekers, M., Shi, X., Kunnen, E., Degroote, B., Jurczak, M., de Potter de ten Broeck, M., Augendre, E. |
|---|---|
| Zdroj: | In Microelectronics Reliability 2005 45(5):865-868 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect