High temperature dissolution of oxides in complexing media

Autor: Sathyaseelan, Valil S., Rufus, Appadurai L., Subramanian, Hariharan, Bhaskarapillai, Anupkumar, Wilson, Shiny, Narasimhan, Sevilimedu V., Velmurugan, Sankaralingam
Zdroj: In Journal of Nuclear Materials 2011 419(1):39-45
Databáze: ScienceDirect