SiC epitaxial layer growth in a novel multi-wafer vapor-phase epitaxial (VPE) reactor
Autor: | Burk, A.A., Jr. *, O'Loughlin, M.J., Nordby, H.D., Jr. |
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Zdroj: | In Journal of Crystal Growth 1999 200(3):458-466 |
Databáze: | ScienceDirect |
Externí odkaz: |
Autor: | Burk, A.A., Jr. *, O'Loughlin, M.J., Nordby, H.D., Jr. |
---|---|
Zdroj: | In Journal of Crystal Growth 1999 200(3):458-466 |
Databáze: | ScienceDirect |
Externí odkaz: |