Establishment of Multi-Physics coupling model and analysis on thermal stress and crack risk in directional growth of TiAl alloys under electromagnetic confinement
| Autor: | Li, Jiaxin, Shen, Jun, Zheng, Shaokai, Zhao, Jiajun, Wang, Wei, Wang, Xudong, Li, Zengdi, Gao, Xiaoyu |
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| Zdroj: | In Journal of Crystal Growth 1 January 2025 649 |
| Databáze: | ScienceDirect |
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