Quantitative evaluation of strain relaxation in annealed sputter-deposited AlN film

Autor: Tanaka, Shuichi, Shojiki, Kanako, Uesugi, Kenjiro, Hayashi, Yusuke, Miyake, Hideto
Zdroj: In Journal of Crystal Growth 15 April 2019 512:16-19
Databáze: ScienceDirect