Investigation on AlN epitaxial growth and related etching phenomenon at high temperature using high temperature chemical vapor deposition process
| Autor: | Claudel, A., Blanquet, E., Chaussende, D., Boichot, R., Doisneau, B., Berthomé, G., Crisci, A., Mank, H., Moisson, C., Pique, D., Pons, M. |
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| Zdroj: | In Journal of Crystal Growth 2011 335(1):17-24 |
| Databáze: | ScienceDirect |
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