Surface preparation of Si(1 0 0) by thermal oxide removal in a chemical vapor environment
| Autor: | Döscher, Henning, Brückner, Sebastian, Dobrich, Anja, Höhn, Christian, Kleinschmidt, Peter, Hannappel, Thomas |
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| Zdroj: | In Journal of Crystal Growth 2011 315(1):10-15 |
| Databáze: | ScienceDirect |
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