Deposition behavior of GaN in AIX 200/4 RF-S horizontal reactor
| Autor: | Yakovlev, E.V. *, Talalaev, R.A., Makarov, Yu.N., Yavich, B.S., Wang, W.N |
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| Zdroj: | In Journal of Crystal Growth 2004 261(2):182-189 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Yakovlev, E.V. *, Talalaev, R.A., Makarov, Yu.N., Yavich, B.S., Wang, W.N |
|---|---|
| Zdroj: | In Journal of Crystal Growth 2004 261(2):182-189 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect