Material optimisation for AlGaN/GaN HFET applications

Autor: Bougrioua, Z. *, Moerman, I., Sharma, N., Wallis, R.H., Cheyns, J., Jacobs, K., Thrush, E.J., Considine, L., Beanland, R., Farvacque, J.-L., Humphreys, C.
Zdroj: In Journal of Crystal Growth 2001 230(3):573-578
Databáze: ScienceDirect