Crystal surface heat transfer during the growth of 300mm monocrystalline silicon by the Czochralski process
| Autor: | Wang, Zhengxing, Ren, Yongsheng, Ma, Wenhui, Lv, Guoqiang, Tan, Mingke, Li, Xuehua, Li, Shaoyuan, Wan, Xiaohan, Zhan, Shu, Zeng, Yi, Li, Ruopu |
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| Zdroj: | In International Journal of Heat and Mass Transfer January 2025 236 Part 1 |
| Databáze: | ScienceDirect |
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