Technology of fabrication of CdSxTe1-x solid solution on silicon substrate

Autor: Sapaev I. B., Sadullaev S., Babajanov D., Sapaev B., Umarov A. V., Pulatov Sh. Y., Meliziaev O. O., Daliev K. S.
Jazyk: English<br />French
Rok vydání: 2023
Předmět:
Zdroj: E3S Web of Conferences, Vol 413, p 04009 (2023)
Druh dokumentu: article
ISSN: 2267-1242
DOI: 10.1051/e3sconf/202341304009
Popis: Heterojunction between Si and CdSxTe1-x have been obtained by the method of vacuum deposition of powders of cadmium sulfide and cadmium telluride on the surface of monocrystalline silicon. The optimal temperature regime for the growth of the CdSxTe1-x solid solution on the silicon surface has been determined. The values of the crystal lattice constant and the thickness of the CdSxTe1-x solid solution at the interface of the n/Si – n/CdSxTe1-x heterostructure are calculated.
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