| Autor: |
Jin-Ho Yeo, Ki-Bong Nam, Gil-Seon Kang, Qicheng Hu, Chang-Young Jeong, Young-Soo Park, Seok Jong Lee, Jaesun Jung, Seung Hyun Lee, Deok Hyun Cho, Mun-Ja Kim, Ji-Beom Yoo |
| Jazyk: |
angličtina |
| Rok vydání: |
2022 |
| Předmět: |
|
| Zdroj: |
Materials Research Express, Vol 9, Iss 6, p 066403 (2022) |
| Druh dokumentu: |
article |
| ISSN: |
2053-1591 |
| DOI: |
10.1088/2053-1591/ac7850 |
| Popis: |
TiN has beneficial physicochemical properties, such as high hardness, good chemical inertness, and good corrosion resistance. TiN has been used for optical filters and protective coatings to exploit these properties. We deposited TiN using atomic layer deposition as a capping layer for a pellicle. We investigated the hydrogen plasma resistance using Raman spectroscopy, transmission electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy. As the hydrogen plasma exposure time increased, bonds formed between the TiN film and nitrogen compounds. With long-term exposure, the thickness of the TiN film decreased owing to etching. |
| Databáze: |
Directory of Open Access Journals |
| Externí odkaz: |
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