Second harmonic microscopy of monolayer MoS2
Autor: | Kumar, Nardeep, Najmaei, Sina, Cui, Qiannan, Ceballos, Frank, Ajayan, Pulickel M., Lou, Jun, Zhao, Hui |
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Rok vydání: | 2013 |
Předmět: | |
Zdroj: | Phys. Rev. B 87, 161403(R) (2013) |
Druh dokumentu: | Working Paper |
DOI: | 10.1103/PhysRevB.87.161403 |
Popis: | We show that the lack of inversion symmetry in monolayer MoS2 allows strong optical second harmonic generation. Second harmonic of an 810-nm pulse is generated in a mechanically exfoliated monolayer, with a nonlinear susceptibility on the order of 1E-7 m/V. The susceptibility reduces by a factor of seven in trilayers, and by about two orders of magnitude in even layers. A proof-of-principle second harmonic microscopy measurement is performed on samples grown by chemical vapor deposition, which illustrates potential applications of this effect in fast and non-invasive detection of crystalline orientation, thickness uniformity, layer stacking, and single-crystal domain size of atomically thin films of MoS2 and similar materials. Comment: 6 pages, 4 figures |
Databáze: | arXiv |
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