Investigation of mechanical losses of thin silicon flexures at low temperatures
| Autor: | Nawrodt, R., Schwarz, C., Kroker, S., Martin, I. W., Brückner, F., Cunningham, L., Große, V., Grib, A., Heinert, D., Hough, J., Käsebier, T., Kley, E. B., Neubert, R., Reid, S., Rowan, S., Seidel, P., Thürk, M., Tünnermann, A. |
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| Rok vydání: | 2010 |
| Předmět: | |
| Zdroj: | Class. Quantum Grav. 30, 115008, 2013 |
| Druh dokumentu: | Working Paper |
| DOI: | 10.1088/0264-9381/30/11/115008 |
| Popis: | The investigation of the mechanical loss of different silicon flexures in a temperature region from 5 to 300 K is presented. The flexures have been prepared by different fabrication techniques. A lowest mechanical loss of $3\times10^{-8}$ was observed for a 130 $\mu$m thick flexure at around 10 K. While the mechanical loss follows the thermoelastic predictions down to 50 K a difference can be observed at lower temperatures for different surface treatments. This surface loss will be limiting for all applications using silicon based oscillators at low temperatures. The extraction of a surface loss parameter using different results from our measurements and other references is presented. We focused on structures that are relevant for gravitational wave detectors. The surface loss parameter $\alpha_s$ = 0.5 pm was obtained. This reveals that the surface loss of silicon is significantly lower than the surface loss of fused silica. Comment: 16 pages, 7 figures |
| Databáze: | arXiv |
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