Characterization of half-metallic L2_1-phase Co_2FeSi full-Heusler alloy films formed by rapid thermal annealing

Autor:	Takamura, Yota, Nakane, Ryosho, Munekata, Hiro, Sugahara, Satoshi
Rok vydání:	2007
Předmět:	Condensed Matter - Materials Science
Zdroj:	J. Appl. Phys. 103 (2008) 07D719
Druh dokumentu:	Working Paper
DOI:	10.1063/1.2838648
Popis:	The authors developed a preparation technique of Co_2FeSi full-Heusler alloy films with the L2_1-ordered structure on silicon-on-insulator (SOI) substrates, employing rapid thermal annealing (RTA). The Co_2FeSi full-Heusler alloy films were successfully formed by RTA-induced silicidation reaction between an ultrathin SOI (001) layer and Fe/Co layers deposited on it. The highly (110)-oriented L2_1-phase polycrystalline full-Heusler alloy films were obtained at the RTA temperature of 700 C. Crystallographic and magnetic properties of the RTA-formed full-Heusler alloy films were qualitatively the same as those of bulk full-Heusler alloy. This technique is compatible with metal source/drain formation process in advanced CMOS technology and would be applicable to the fabrication of the half-metallic source/drain of MOSFET type of spin transistors. Comment: 18 pages, 5 figures
Databáze:	arXiv
Externí odkaz:	http://arxiv.org/abs/0711.2404 Zobrazit plný text záznamu View this record from Arxiv