Simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors

Autor: Lorant, Christophe, Descamps, Pierre, De Wilde, Juray, 1st BeLux workshop on 'Coating, Materials, surfaces and Interfaces
Přispěvatelé: UCL - SST/IMMC/IMAP - Materials and process engineering
Jazyk: angličtina
Rok vydání: 2014
Předmět:
Popis: The simulation of low-temperature, atmospheric-pressure plasma enhanced chemical vapor deposition reactors is challenging due to the coupling of the fluid dynamics, the chemical reactions and the electric field and the stiffness of the resulting mathematical system. The model equations and the rigorous model reduction to reduce the stiffness are addressed in this paper. Considering pure nitrogen plasma, simulations with two configurations are discussed.
Databáze: OpenAIRE