Autor: |
Andryushchenko, L.A., Boyarintsev, A.Yu., Grinyov, B.V., Kilimchuk, I.V., Kudin, A.M., Tarasov, V.A., Vyday, Yu.T. |
Jazyk: |
angličtina |
Rok vydání: |
2006 |
Předmět: |
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Popis: |
The influence of mechanical and chemical methods of CsI:TI and Nal:TI crystals surface treatment on their scintillation characteristics at registration of short-range ionizing radiation has been investigated. It is shown that application of ultrathin silicon dioxide powder obtained by sol-gel method and organosilicon liquids at the polishing stage provides the near-surface layer of CsI:TI and NaI:TI crystals with minimum light yield nonuniformity. After grinding of the crystal surface, the stability of scintillation characteristics can be achieved by the surface treatment with tetraethoxy silane and oligo-(siloxane hydride) liquid. Application of thin-film organosilicon coating on the CsI:TI crystal surface turned to the radiation source has improved the pulse-height resolution by 3-5 % in the absolute value at registration of X-ray radiation with E = 5.9 keV. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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